Progress in the multi-trigger resist-Reference-Cited by-同舟云学术

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Progress in the multi-trigger resist

Published:2021-04-05 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXVIII
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Author:

Popescu Carmen M.,O'Callaghan Greg,McClelland Alex,Roth John,Lada Tom,Kudo Takanori,Dammel Ralph,Moinpour Mansour,Cao Yi,Robinson Alex P. G.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New EUV mask blank for N3 technology node and beyond;Photomask Technology 2023;2023-11-21

2. EUV APSM mask prospects and challenges;Photomask Technology 2023;2023-11-21

3. Multi-Trigger Resist for EUV lithography;Journal of Photopolymer Science and Technology;2023-06-15

4. Recent accomplishments in EUV lithography patterning for multi-trigger resist;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

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