1. EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity, and stochastic defectivity;Nagahara;Proc. SPIE,2020
2. A novel main chain scission type photoresists for EUV lithography;Shirotori;Proc SPIE,2020
3. All-new nickel-based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning;Sharma;Proc SPIE,2020
4. Multi-trigger resist patterning with ASML NXE3300 EUV scanner;Vesters;Proc. SPIE,2018
5. High-resolution EUV lithography using a multi-trigger resist;Popescu;Proc. SPIE,2018