Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow-Reference-Cited by-同舟云学术

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Published:2015-07-02 Issue:3 Volume:14 Page:031204
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Pathangi Hari¹,Chan Boon Teik¹,Bayana Hareen¹,Vandenbroeck Nadia¹,Heuvel Dieter Van Den¹,Look Lieve Van¹,Rincon-Delgadillo Paulina¹,Cao Yi²,Kim JiHoon²,Lin Guanyang²,Parnell Doni³,Nafus Kathleen⁴,Harukawa Ryota⁵,Chikashi Ito⁵,Polli Marco⁵,D’Urzo Lucia⁶,Gronheid Roel¹,Nealey Paul⁷

Affiliation:

1. IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

2. EMD Performance Materials Corp., 70 Meister Avenue, Somerville, New Jersey 08876, United States

3. Tokyo Electron Europe Limited, Kerkenbos 10-15 Unit C, 6546 BB Nijmegen, The Netherlands

4. Tokyo Electron America, Inc., 2400 Grove Boulevard, Austin, Texas 78741, United States

5. KLA-Tencor Corporation, 1 Technology Drive, Milpitas, California 95035, United States

6. Entegris® GmbH, Hugo-Junkers-Ring 5, Gebäude 107/W, Dresden 01109, Germany

7. Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, Illinois 60637, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Self-assembling materials for lithographic patterning: overview, status, and moving forward

2. Block copolymer directed self-assembly enables sublithographic patterning for device fabrication

3. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

4. Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

5. Defect source analysis of directed self-assembly process (DSA of DSA)

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