Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow-Reference-Cited by-同舟云学术

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Published:2014-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Gronheid Roel,Rincon Delgadillo Paulina,Pathangi Hari,Van den Heuvel Dieter,Parnell Doni,Chan Boon Teik,Lee Yu-Tsung,Van Look Lieve,Cao Yi,Her YoungJun,Lin Guanyang,Harukawa Ryota,Nagaswami Venkat,D'Urzo Lucia,Somervell Mark,Nealey Paul

Publisher

SPIE

Reference6 articles.

1. Addressing the Challenges of Directed Self Assembly Implementation;Gronheid,2011

2. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

3. Self-Assembly Patterning for sub-15nm Half-Pitch: A Transition from Lab to Fab;Bencher,2011

4. Towards an all-track 300 mm process for directed self-assembly

5. Defect source analysis of directed self-assembly process

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