Calibration of chemically amplified resist models-Reference-Cited by-同舟云学术

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Calibration of chemically amplified resist models

Published:1996-06-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Byers Jeff D.,Petersen John S.,Sturtevant John L.

Publisher

SPIE

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical proximity correction by using unsupervised learning and the patch loss function;Applied Optics;2022-05-02

2. Fourier spectrum method to determine dose-to-clear in a photoresist;Optics Letters;2014-01-15

3. (Invited) Advanced Modeling for Full-Chip Low-k1 Lithography Simulations;ECS Transactions;2013-03-08

4. A full-chip 3D computational lithography framework;SPIE Proceedings;2012-02-21

5. Understanding Acid Reaction and Diffusion in Chemically Amplified Photoresists: An Approach at the Molecular Level;The Journal of Physical Chemistry C;2011-09-29

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