Understanding Acid Reaction and Diffusion in Chemically Amplified Photoresists: An Approach at the Molecular Level-Reference-Cited by-同舟云学术

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Understanding Acid Reaction and Diffusion in Chemically Amplified Photoresists: An Approach at the Molecular Level

Published:2011-09-29 Issue:42 Volume:115 Page:20367-20374
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Rodríguez-Cantó Pedro J.¹²,Nickel Ulrich¹,Abargues Rafael³

Affiliation:

1. Department of Physical Chemistry, University of Erlangen, Egerlandstrasse 3, D-91058 Erlangen, Germany

2. Material Science Institute, University of Valencia, P.O. Box 22085, E-46071 Valencia, Spain

3. Intenanomat S.L, C/Catedrático José Beltrán 2, 46980 Paterna, Spain

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp2027548

Reference31 articles.

1. Chemical amplification resists: Inception, implementation in device manufacture, and new developments

2. Calibration of chemically amplified resist models

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2. A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography;ACS Omega;2023-03-21

3. Spray-driven halide exchange in solid-state CsPbX₃ nanocrystal films;Nanoscale;2022

4. Unraveling the Mechanistic Origins of Epoxy Degradation in Acids;ACS Omega;2019-06-20

5. Spatial Control of Photoacid Diffusion in Chemically Amplified Resist (CAR) via External Electric Field;Journal of Nanoscience and Nanotechnology;2018-09-01

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