Author:
Liu Peng,Zhang Zhengfan,Lan Song,Zhao Qian,Feng Mu,Liu Hua-yu,Vellanki Venu,Lu Yen-wen
Cited by
23 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A Unified Machine Learning Through Focus Resist 3-D Structure Model;IEEE Transactions on Semiconductor Manufacturing;2024-02
2. Fast diffraction model of an EUV mask based on asymmetric patch data fitting;Applied Optics;2023-08-21
3. EUV光刻三维掩模成像研究进展;Laser & Optoelectronics Progress;2022
4. Lithographic exposure latitude aware source and mask optimization;10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro-Nano Manufacturing Technologies;2021-12-13
5. Multi-objective adaptive source optimization for full chip;Applied Optics;2021-03-15