Calibrating the pupil fill balance for hypernumerical aperture lithographic objective-Reference-Cited by-同舟云学术

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Calibrating the pupil fill balance for hypernumerical aperture lithographic objective

Published:2015-09-21 Issue:9 Volume:54 Page:095103
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Rui Dawei¹,Zhang Wei²,Yang Huaijiang²

Affiliation:

1. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, No. 3888 of Dong Nanhu Road, Jingkai District, Changchun City, Jilin Province 130033, ChinabState Key Laboratory of Applied Optics, Changchun, Jilin 130033, China

2. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, No. 3888 of Dong Nanhu Road, Jingkai District, Changchun City, Jilin Province 130033, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Reference9 articles.

1. The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors

2. Quasi-telecentricity: the effects of unbalanced multipole illumination

3. Large-format telecentric lens

4. Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

5. Modeling and experiments of non-telecentric thick mask effects for EUV lithography

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 光刻机环状多分区高能量利用率光瞳校正研究;Chinese Journal of Lasers;2021

2. Programmable pupil correction method for photolithography illumination system;Optik;2020-04

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