Author:
Zhu Siyu,Niu Zhiyuan,Zhang Fang,Ma Xiaozhe,Zeng Zongshun,Cheng Weilin,Shi Weijie,Huang Huijie
Funder
Intergovernmental International Cooperation Program in Science and Technology Innovation
International Science & Technology Cooperation Program of Shanghai
Youth Innovation Promotion Association CAS
Science and Technology Commission of Shanghai Municipality
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference27 articles.
1. Principles of Lithography;Levinson,2011
2. Resolution enhancement techniques in optical lithography;Wong,2001
3. Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations;Kim;Microelectron. Eng.,2017
4. Freeform lens arrays for off-axis illumination in an optical lithography system;Wu;Appl. Opt.,2011
5. Design and fabrication of customized illumination patterns for low k1 lithography: a diffractive approach;Himel,2001
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献