Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations-Reference-Cited by-同舟云学术

Impact of transmission non-uniformity of a wrinkled EUV pellicle for N5 patterning under various illuminations

Published:2017-06 Issue: Volume:177 Page:35-40
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Kim In-Seon,Kim Guk-Jin,Yeung Michael,Barouch Eytan,Oh Hye-Keun

Funder

Samsung electronics mask development team

National Research Foundation of Korea (NRF)

Ministry of Education, Science and Technology

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. International Technology Roadmap for Semiconductors (ITRS);Wilson,2013

2. EUV Lithography;Vivek,2009

3. Closing address;Ronse,2015

4. Principle of Lithography;Levinson,2005

5. Pellicle HVM Specifications;Brouns,2016

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