Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension-Reference-Cited by-同舟云学术

Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension

Published:2014-12-08 Issue:4 Volume:13 Page:041413
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Vaid Alok¹,Osorio Carmen¹,Tsai Jamie¹,Bozdog Cornel²,Sendelbach Matthew²,Grubner Eyal³,Koret Roy³,Wolfling Shay³

Affiliation:

1. GlobalFoundries, 400 Stonebreak Road Extension, Malta, New York 12020, United States

2. Nova Measuring Instruments, Inc., 2055 Gateway Place, Suite 470, San Jose, California 95110, United States

3. Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Implementation of hybrid metrology at HVM fab for 20nm and beyond

2. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

3. Hybrid metrology solution for 1X node technology

4. Product-driven material characterization for improved scatterometry time-to-solution

5. Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets

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