Author:
Badger Karen,Gallagher Emily,Seki Kazunori,McIntyre Gregory,Konishi Toshio,Kodera Yutaka,Redding Vincent
Cited by
6 articles.
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1. Improved ptychographic inspection of EUV reticles via inclusion of prior information;Applied Optics;2020-07-06
2. Minimizing "Tone Reversal" during 19x nm mask inspection;Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology;2018-06-12
3. Printability of buried extreme ultraviolet lithography photomask defects;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-02-01
4. ENDEAVOUR to understand EUV buried defect printability;Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII;2015-07-09
5. Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging;Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII;2015-07-09