Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging-Reference-Cited by-同舟云学术

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging

Published:2015-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
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Author:

Mangat Pawitter,Verduijn Erik,Wood Obert R.,Benk Markus P.,Wojdyla Antoine,Goldberg Kenneth A.

Publisher

SPIE

Reference12 articles.

1. Assessing EUV mask defectivity;Okoroanyanwu,2010

2. EUV reticle defectivity evaluation;Tchikoulaeva,2009

3. Integration of an EUV metal layer: a 20/14nm demo;Higgins,2014

4. Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers;Badger,2013

5. EUV actinic blank inspection: from prototype to production;Tchikoulaeva,2013

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