ENDEAVOUR to understand EUV buried defect printability-Reference-Cited by-同舟云学术

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ENDEAVOUR to understand EUV buried defect printability

Published:2015-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
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Author:

Seki Kazunori,Isogawa Takeshi,Kagawa Masayuki,Akima Shinji,Kodera Yutaka,Badger Karen,Qi Zhengqing John,Lawliss Mark,Rankin Jed,Bonam Ravi

Publisher

SPIE

Reference10 articles.

1. Shedding light on EUV inspection;Seki,2012

2. Illuminating EUVL mask defect printability;Badger,2012

3. Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers;Badger,2013

4. Reflecting on inspectability and wafer printability of EUV mask absorbers;Seki,2013

5. Illuminating extreme ultraviolet lithography mask defect printability

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Phase-independent multilayer defect repair for EUV photomasks;SPIE Proceedings;2016-10-04

2. Defect avoidance for EUV photomask readiness at the 7 nm node;SPIE Proceedings;2016-05-10

3. Toward defect-free fabrication of extreme ultraviolet photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-04-12

4. Evaluation of multilayer defect repair viability and protection techniques for extreme ultraviolet masks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-18

5. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-02-02

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