Progress on 0.33 NA EUV systems for High-Volume Manufacturing-Reference-Cited by-同舟云学术

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Progress on 0.33 NA EUV systems for High-Volume Manufacturing

Published:2019-09-26 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2019
language:
Short-container-title:

Author:

Mastenbroek Marcel

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Towards fast ptychography image reconstruction of EUV masks by deep neural networks;Photomask Technology 2023;2023-11-21

2. 4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node;IEEE Transactions on Electron Devices;2023-11

3. A fast mask diffraction model towards rigorous simulation in terms of accuracy;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12

4. State of the Art and Future Perspectives in Advanced CMOS Technology;Nanomaterials;2020-08-07

5. EUV reticle defectivity protection options;Photomask Technology 2019;2019-10-10

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