Mask modeling using a deep learning approach-Reference-Cited by-同舟云学术

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Mask modeling using a deep learning approach

Published:2019-09-26 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2019
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Author:

Zepka Alex,Aliyeva Sabrina,Kulkarni Parikshit,Chaudhary Narendra

Publisher

SPIE

Reference12 articles.

1. Computer modeling of LED light pipe systems for uniform display illumination;Van Derlofske,2001

2. Advanced mask process modeling for 45-nm and 32-nm nodes

3. MPC model sensitivity analysis: model ambit vs. correction runtime;Zepka,2019

4. Applying MPC for EUV mask fabrication;Tsunoda,2018

5. Mask model calibration for MPC applications utilizing shot dose assignment

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1. EUV光刻三维掩模成像研究进展;Laser & Optoelectronics Progress;2022

2. Detecting gaps in deep learning models used for mask process modeling;Photomask Technology 2020;2020-10-13

3. The choice of input data and its impact on a deep learning mask model;Photomask Technology 2020;2020-10-13

4. SEM Image Denoising and Contour Image Estimation using Deep Learning;2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2020-08

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