Mask model calibration for MPC applications utilizing shot dose assignment-Reference-Cited by-同舟云学术

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Mask model calibration for MPC applications utilizing shot dose assignment

Published:2014-10-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Bork Ingo,Buck Peter,Paninjath Sankaranarayanan,Mishra Kushlendra,Bürgel Christian,Standiford Keith,Chua Gek Soon

Publisher

SPIE

Reference4 articles.

1. Entering mask process correction era for EUV mask manufacturing;Bürgel,2013

2. Correction for etch proximity: new models and applications

3. A variable span scatterplot smoother;Friedman,1984

4. Using rule-based shot dose assignment in model-based MPC applications;Bork,2014

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask modeling using a deep learning approach;Photomask Technology 2019;2019-09-26

2. MPC simplification for established model-based mask process correction solutions;Photomask Technology 2019;2019-09-26

3. Mask process correction method comparison and study: CD-SEM box versus standard correction method;Photomask Technology;2017-10-16

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