1. 2018 mask makers’ survey conducted by the eBeam Initiative;Fujimura,2018
2. Model based mask process correction and verification for advanced process nodes;Lin,2009
3. The impact of 14-nm photomask uncertainties on computational lithography solutions;Sturtevant,2013
4. Entering mask process correction era for EUV mask manufacturing;Burgel,2013
5. Mask model calibration for MPC applications utilizing shot dose assignment;Bork,2014