Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning-Reference-Cited by-同舟云学术

Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
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Author:

Vanelderen Pieter,Blanco Victor,Mao Ming,Tomczak Yoann,de Roest David,Kissoon Nicola,Rincon Delgadillo Paulina,Rispens Gijsbert,Schiffelers Guido,Pathak Abhinav,Lazzarino Frederic,De Simone Danilo,de Poortere Etienne,McManus Moyra,Piumi Daniele,Hendrickx Eric,Vandenberghe Geert

Publisher

SPIE

Reference13 articles.

1. New Insights into Sequential Infiltration Synthesis

2. Enhanced polymeric lithography resists via sequential infiltration synthesis

3. Shot noise: A 100 year history, with applications to lithography;Mack,2018

4. Line-edge roughness and the ultimate limits of lithography

5. Stochastic printing failures in extreme ultraviolet lithography

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