"Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist-Reference-Cited by-同舟云学术

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"Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist

Published:1988-01-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Miura Konoe¹,Ochiai Tameichi¹,Kameyama Yasuhiro¹,Kashi Chie¹,Uoya Shigeo²,Nakajima Masayuki²,Kawai Akira²,Kishimura Shinji²

Affiliation:

1. Mitsubishi Chemical Industries Ltd. (Japan)

2. Mitsubishi Electric Corporation (Japan)

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Local Peeling of Photoresist Film during Ultraviolet Light Exposure;Japanese Journal of Applied Physics;1994-01-15

2. Adhesion of Photoresist Pattern Baked at 80 to $\bf 325^{\circ} C$ to Inorganic Solid Surface;Japanese Journal of Applied Physics;1994-01-15

3. Adhesion of Photoresist Pattern Baked at 80 to 325°C in Tetramethyl-ammonium-hydroxide Aqueous Solution;Japanese Journal of Applied Physics;1992-11-15

4. Masking effect of photoactive compounds with various ballast molecules in novolak-naphthoquinonediazide positive photoresists;Polymer Engineering and Science;1992-10

5. Design of high-resolution positive-working photoresist;Journal of Photochemistry and Photobiology A: Chemistry;1992-04

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