Masking effect of photoactive compounds with various ballast molecules in novolak-naphthoquinonediazide positive photoresists-Reference-Cited by-同舟云学术

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Masking effect of photoactive compounds with various ballast molecules in novolak-naphthoquinonediazide positive photoresists

Published:1992-10 Issue:20 Volume:32 Page:1550-1555
ISSN:0032-3888
Container-title:Polymer Engineering and Science
language:en
Short-container-title:Polym. Eng. Sci.

Author:

Kishimura Shinji,Yamaguchi Atsumi,Yamada Yoshiaki,Nagata Hitoshi

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry

Reference13 articles.

1. "Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist

2. and SPE RETEC on Photopolymers, p. 235, Ellenville, N.Y. (1988).

3. Mechanisms Of The Dissolution Inhibition Effect And Their Application To Designing Novel Deep-UV Resists

4. Studies of the molecular mechanism of dissolution inhibition of positive photoresists based on novolac-DNQ

5. Novolak Design For High Resolution Positive Photoresists

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chemistry and processing of resists for nanolithography;Nanolithography;2014

2. Unsubstituted Hydroxybenzophenones (Class of METHANONES);Aromatic Hydroxyketones: Preparation and Physical Properties;2011

3. Lithographic Resists;Kirk-Othmer Encyclopedia of Chemical Technology;2005-06-17

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