Design of high-resolution positive-working photoresist-Reference-Cited by-同舟云学术

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Design of high-resolution positive-working photoresist

Published:1992-04 Issue:1-2 Volume:65 Page:277-284
ISSN:1010-6030
Container-title:Journal of Photochemistry and Photobiology A: Chemistry
language:en
Short-container-title:Journal of Photochemistry and Photobiology A: Chemistry

Author:

Ochiai Temeichi,Kameyama Yasuhiro,Takasaki Ryuichiro,Ishiguro Tomoyo,Nishi Mineo,Miura Konoe

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Chemical Engineering,General Chemistry

Reference8 articles.

1. "Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist

2. F. Endermann, Wiesbaden, W. Neugebauer and M.K. Reichel, US Patent 3,148,983, 1964.

3. K. Miura, T. Ochiai and Y. Kameyama, Jpn. Kokai Tokkyo Koho JP 61, 185741 [86, 185741].

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Analysis on Radical Photo- and Thermal-Polymerization of Negative-Tone Acrylic Resist for High Resolution;Journal of Photopolymer Science and Technology;2015

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