Directed self-assembly process integration: Fin patterning approaches and challenges-Reference-Cited by-同舟云学术

Directed self-assembly process integration: Fin patterning approaches and challenges

Published:2014-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Sayan Safak,Chan B. T.,Gronheid Roel,Van Roey Frieda,Kim Min-Soo,Williamson Lance,Nealey Paul

Publisher

SPIE

Reference5 articles.

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2. Nicholas Fuller and Michael Guillorn;Tsai,2012

3. Towards an all-track 300 mm process for directed self-assembly

4. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats

5. Method for producing fin structure of a semiconductor device in a substrate, Application number: EP14156358.5, Date of filing: 02/24/2014.

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