Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation
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SPIE
Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Driving Force Dependence of Electron Transfer from Electronically Excited [Ir(COD)(μ-Me2pz)]2 to Photo-Acid Generators;The Journal of Physical Chemistry A;2017-09-28
2. Simulation and experimentation of PSCAR chemistry for complex structures;SPIE Proceedings;2017-03-27
3. Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure;SPIE Proceedings;2017-03-27
4. Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18
5. High-sensitivity EUV resists based on fluorinated polymers;SPIE Proceedings;2011-03-17
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