1. Resist blur and line edge roughness;Gallatin,2005
2. Fundamental Limits to EUV Photoresist;Gallatin,2007
3. Cost-effective shrink with Holistic Lithography, extended by EUV;van den Brink,2015
4. EUVL readiness for 7nm;Phillips,2015
5. Progress on enabling EUV Lithography for high volume manufacturing;Chen,2015