Double patterning process with freezing technique-Reference-Cited by-同舟云学术

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Double patterning process with freezing technique

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXVI
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Author:

Wakamatsu Goji,Anno Yusuke,Hori Masafumi,Kakizawa Tomohiro,Mita Michihiro,Hoshiko Kenji,Shioya Takeo,Fujiwara Koichi,Kusumoto Shiro,Yamaguchi Yoshikazu,Shimokawa Tsutomu

Publisher

SPIE

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advanced Lithography;Springer Handbook of Semiconductor Devices;2022-11-11

2. Lithographic imaging-driven pattern edge placement errors at the 10-nm node;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-30

3. Lithographic imaging-driven pattern edge placement errors at 10nm node;SPIE Proceedings;2016-03-15

4. Source/Drain Series Resistance Extraction in HKMG Multifin Bulk FinFET Devices;IEEE Transactions on Semiconductor Manufacturing;2015-05

5. Single lithography exposure edge placement model;SPIE Proceedings;2015-03-18

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