High-volume manufacturing equipment and processing for directed self-assembly applications

Author:

Somervell Mark,Yamauchi Takashi,Okada Soichiro,Tomita Tadatoshi,Nishi Takanori,Iijima Etsuo,Nakano Takeo,Ishiguro Takumi,Nagahara Seiji,Iwaki Hiroyuki,Dojun Makiko,Ozawa Mariko,Yatsuda Koichi,Tobana Toshikatsu,Romo Negreira Ainhoa,Parnell Doni,Kawakami Shinchiro,Muramatsu Makoto,Rathsack Benjamen,Nafus Kathleen,Peyre Jean-Luc,Kitano Takahiro

Publisher

SPIE

Reference26 articles.

1. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

2. Templated self-assembly of Si-containing block copolymers for nanoscale device fabrication;Ross,2011

3. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats

4. Comparison of directed self-assembly integrations;Somervell,2012

5. Pattern Scaling with Directed Self Assembly Through Lithography and Etch Process Integration;Rathsack,2012

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