Defect and roughness reduction of chemo-epitaxy DSA pattern-Reference-Cited by-同舟云学术

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Defect and roughness reduction of chemo-epitaxy DSA pattern

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Novel Patterning Technologies 2018
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Author:

Muramatsu Makoto,Nishi Takanori,You Gen,Ido Yasuyuki,Kitano Takahiro

Publisher

SPIE

Reference6 articles.

1. Pattern scaling with directed self assembly through lithography and etch process integration;Rathsack,2012

2. Advances in directed self assembly integration and manufacturability at 300 mm;Rathsack,2013

3. High-volume manufacturing equipment and processing for directed self-assembly applications;Somervell,2014

4. Driving DSA into volume manufacturing;Somervell,2015

5. Pattern fidelity improvement of chemo-epitaxy DSA process for high volume manufacturing;Muramatsu,2016

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hexagonal arrays of contact holes with chemo-epitaxial DSA;Novel Patterning Technologies 2022;2022-05-25

2. Self-aligned double pattern process using DSA pattern;Advances in Patterning Materials and Processes XXXVIII;2021-02-22

3. Directed self-assembly of block copolymers for sub-10 nm fabrication;International Journal of Extreme Manufacturing;2020-08-12

4. Block copolymer directed self-assembly defect modes induced by localized errors in chemoepitaxial guiding underlayers: A molecular simulation study;Journal of Vacuum Science & Technology B;2020-05

5. Defect mitigation of chemo-epitaxy DSA patterns;Advances in Patterning Materials and Processes XXXVII;2020-03-23

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