Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging
Author:
Affiliation:
1. Paul Scherrer Institut, Villigen
2. Fraunhofer Institute for Laser Technology, Aachen
3. Peter Grünberg Institute 9, Semiconductor Nanoelectronics, Research Center Jülich, Jülich
Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
2. Actinic inspection of EUV reticles with arbitrary pattern design
3. RESCAN: an actinic lensless microscope for defect inspection of EUV reticles
4. CNTs in the context of EUV pellicle history (Conference Presentation)
5. Free-standing carbon nanotube films for extreme ultraviolet pellicle application
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