Free-standing carbon nanotube films for extreme ultraviolet pellicle application-Reference-Cited by-同舟云学术

Free-standing carbon nanotube films for extreme ultraviolet pellicle application

Published:2018-11-27 Issue:04 Volume:17 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Timmermans Marina Y.¹,Mariano Marina¹,Pollentier Ivan¹,Richard Olivier¹,Huyghebaert Cedric¹,Gallagher Emily E.¹

Affiliation:

1. IMEC, Leuven

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Transmission measurements of pellicles for deep-UV lithography

2. Review of progress in extreme ultraviolet lithography masks

3. EUV progress toward HVM readiness

4. Pellicle industrialization update;Brouns,2018

5. Fabrication of a full-size EUV pellicle based on silicon nitride

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