UV NIL template making and imprint evaluation-Reference-Cited by-同舟云学术

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UV NIL template making and imprint evaluation

Published:2008-10-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photomask Technology 2008
language:
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Author:

Sasaki Shiho,Hiraka Takaaki,Mizuochi Jun,Fujii Akiko,Sakai Yuko,Sutou Takanori,Yusa Satoshi,Kuriyama Koki,Sakaki Masashi,Morikawa Yasutaka,Mohri Hiroshi,Hayashi Naoya

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metrology and inspection required for next generation lithography;Japanese Journal of Applied Physics;2017-04-24

2. Nanohole and dot patterning processes on quartz substrate byR–θ electron beam lithography and nanoimprinting;Japanese Journal of Applied Physics;2016-05-23

3. A master-mold fabrication by electron beam lithography followed by nanoimprinting and self-aligned double patterning;Japanese Journal of Applied Physics;2014-05-27

4. Mask replication using jet and flash imprint lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-10-01

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