A master-mold fabrication by electron beam lithography followed by nanoimprinting and self-aligned double patterning-Reference-Cited by-同舟云学术

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A master-mold fabrication by electron beam lithography followed by nanoimprinting and self-aligned double patterning

Published:2014-05-27 Issue:6S Volume:53 Page:06JK05
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Watanabe Tsuyoshi,Suzuki Kouta,Iyama Hiromasa,Kagatsume Takeshi,Kishimoto Shuji,Sato Takashi,Kobayashi Hideo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/53/i=6S/a=06JK05/pdf

Reference31 articles.

1. Recording technologies for terabit per square inch systems

2. Patterned media for future magnetic data storage

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1. Plasmonic lithography for the fabrication of surface nanostructures with a feature size down to 9 nm;Nanoscale;2020

2. Effect of Current Density on Quality of Electroformed Mold Inserts with Micro/Nano-cavities;CAILIAO GONGCHENG;2017

3. Simple and scalable preparation of master mold for nanoimprint lithography;Nanotechnology;2017-04-26

4. Silica imprint templates with concave patterns from single-digit nanometers fabricated by electron beam lithography involving argon ion beam milling;Japanese Journal of Applied Physics;2017-04-26

5. Nanohole and dot patterning processes on quartz substrate byR–θ electron beam lithography and nanoimprinting;Japanese Journal of Applied Physics;2016-05-23

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