1. Jo Finders et al., “Litho and patterning challenges for memory and logic applications at 22nm node”, Proc. SPIE. 7640
2. Jo Finders et al., “Mask 3D effects: impact on Imaging and Placement” EMLC 2011, Proc. SPIE. 7985
3. Impact of Reticle Absorber on the Imaging Properties in ArFi Lithography;Finders,2012
4. The impact of Mask 3D and Resist 3D effects in optical lithography;Finders,2014