Elucidating the role of imaging metrics for variability and after etch defectivity
Author:
Affiliation:
1. IMEC, Leuven
2. Tokyo Electron Kyushu Ltd., Kumamoto
3. ASML Netherlands B.V., Veldhoven
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Arts and Humanities
Reference17 articles.
1. High-NA EUV lithography exposure tool: advantages and program progress
2. On the dependencies of the stochastic patterning-failure cliffs in EUVL lithography
3. Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography
4. Mask 3D induced phase and the mitigation by absorber optimization
5. Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography
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1. Mask innovations on the eve of high NA EUV lithography;Japanese Journal of Applied Physics;2024-04-01
2. Addressing misclassification costs in machine learning through asymmetric loss functions;Metrology, Inspection, and Process Control XXXVII;2023-04-27
3. Aerial image metrology (AIMS) based mask-model accuracy improvement for computational lithography;Photomask Technology 2022;2022-12-01
4. Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-10-14
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