Toward the 5nm technology: layout optimization and performance benchmark for logic/SRAMs using lateral and vertical GAA FETs

Author:

Huynh-Bao Trong,Ryckaert Julien,Sakhare Sushil,Mercha Abdelkarim,Verkest Diederik,Thean Aaron,Wambacq Piet

Publisher

SPIE

Reference12 articles.

1. Technology-design- manufacturing co-optimization for advanced mobile SoCs,;Yang,2014

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4. DTCO at N7 and beyond: patterning and electrical compromises and opportunities,;Ryckaert,2015

5. Circuit and process co-design with vertical gate-all-around nanowire FET technology to extend CMOS scaling for 5nm and beyond technologies,;Huynh Bao,2014

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