Target design optimization for overlay scatterometry to improve on-product overlay-Reference-Cited by-同舟云学术

Target design optimization for overlay scatterometry to improve on-product overlay

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Smilde Henk-Jan H.,van Haren Richard J. F.,van Buël Willy,Driessen Lars H. D.,Dépré Jérôme,Beltman Jan,Dettoni Florent,Ducoté Julien,Dezauzier Christophe,Blancquaert Yoann

Publisher

SPIE

Reference5 articles.

1. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections;Bhattacharyya,2013

2. Evaluation of a novel ultra small target technology supporting on product overlay measurements;Smilde,2012

3. Performance of ASML YieldStar μDBO overlay targets for advanced lithography nodes C028 and C014 overlay process control;Blancquaert,2013

4. Sub-nanometer in-die overlay metrology: measurement and simulation at the edge of finiteness;Smilde,2013

5. Lithographic apparatus, substrate and device manufacturing method;Quintanilha,2013

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4. Scatterometry—fast and robust measurements of nano-textured surfaces;Surface Topography: Metrology and Properties;2016-04-05

5. Artificial Neural Network for Diffraction Based Overlay Measurement;IEEE Access;2016