1. Simultaneous overlay and CD measurement for double patterning: scatterometry and RCWA approach;Li;Proc. SPIE,2009
2. Fundamental Principles of Optical Lithography: The Science of Microfabrication;Mack,2018
3. Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time and cost at litho;Bhattacharyya;Proc. SPIE,2015
4. Towards 3 nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography;William;Proc. SPIE,2008
5. A novel method for overlay measurement by scatterometry;Hsu;Proc. SPIE,2009