Transient enhanced diffusion from decaborane molecular ion implantation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.122353
Reference7 articles.
1. Shallow junction formation by polyatomic cluster ion implantation
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5. Reduction of transient diffusion from 1–5 keV Si+ ion implantation due to surface annihilation of interstitials
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