High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3290870
Reference12 articles.
1. Control of ion energy distribution at substrates during plasma processing
2. Numerical modeling of capacitively coupled hydrogen plasmas: Effects of frequency and pressure
3. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
4. Capacitive discharges driven by combined dc/rf sources
5. Secondary electrons in rf and dc/rf capacitive discharges
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