1. NXT:1980Di immersion scanner for 7nm and 5nm production nodes;de Graaf,2016
2. EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update;van Es,2018
3. Wafer edge overlay control solution for N7 and beyond;van Haren,2018
4. Simulation of a two-dimensional sheath over a flat insulator–conductor interface on a radio-frequency biased electrode in a high-density plasma;Doosik;J. Appl. Phys.,2004
5. High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics