Rapid thermal annealing of Al‐Si contacts

Author:

Pai C. S.,Cabreros E.,Lau S. S.,Seidel T. E.,Suni I.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Screen printing metallization of boron emitters;Progress in Photovoltaics: Research and Applications;2009-12-29

2. Interfacial structure of oxidized AlN(0002)∕Si(111) thin film;Journal of Applied Physics;2005-08-15

3. Characteristics of sputtered TaBx thin films as diffusion barriers between copper and silicon;Applied Surface Science;2003-12

4. Diffusion barrier properties of sputtered TaNx between Cu and Si using TaN as the target;Materials Chemistry and Physics;2003-06

5. Annealing effects of aluminum silicate films grown on Si(100);Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-05

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