Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states-Reference-Cited by-同舟云学术

Tuning extreme ultraviolet emission for optimum coupling with multilayer mirrors for future lithography through control of ionic charge states

Published:2014-01-21 Issue:3 Volume:115 Page:033302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Ohashi Hayato,Higashiguchi Takeshi,Li Bowen,Suzuki Yuhei,Kawasaki Masato,Kanehara Tatsuhiko,Aida Yuya,Torii Shuichi,Makimura Tetsuya,Jiang Weihua,Dunne Padraig,O'Sullivan Gerry,Nakamura Nobuyuki

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4862441

Reference24 articles.

1. Lithography gets extreme

2. Physical processes in EUV sources for microlithography

3. LPP-EUV light source development for high volume manufacturing lithography

4. EUV spectra of Gd and Tb ions excited in laser-produced and vacuum spark plasmas

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