LPP-EUV light source development for high volume manufacturing lithography-Reference-Cited by-同舟云学术

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LPP-EUV light source development for high volume manufacturing lithography

Published:2013-04-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography IV
language:
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Author:

Mizoguchi Hakaru,Nakarai Hiroaki,Abe Tamotsu,Ohta Takeshi,Nowak Krzysztof M.,Kawasuji Yasufumi,Tanaka Hiroshi,Watanabe Yukio,Hori Tsukasa,Kodama Takeshi,Shiraishi Yutaka,Yanagida Tatsuya,Yamada Tsuyoshi,Yamazaki Taku,Okazaki Shinji,Saitou Takashi

Publisher

SPIE

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced extreme ultraviolet conversion efficiency of a 2 μ m laser-driven preformed tin-droplet target using short picosecond pre-pulses;Physics of Plasmas;2023-04-01

2. Effect of Hydrogen Ion Energy in the Process of Reactive Ion Etching of Sn Thin Films by Hydrogen Plasmas;Plasma and Fusion Research;2021-02-08

3. Design of Microstructure Parameters on a Small Multi-Throttle Aerostatic Guideway in Photolithography;Engineering;2021-02

4. Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source;Applied Physics Express;2020-10-15

5. Tuning laser wavelength and pulse duration to improve the conversion efficiency and performance of EUV sources for nanolithography;Physics of Plasmas;2020-10

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