Reactions of XeF2chemisorbed on Si(111) 7×7
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.95699
Reference15 articles.
1. The etching of silicon with XeF2vapor
2. Gaseous products from the reaction of XeF2with silicon
3. Comparison of XeF2 and F‐atom reactions with Si and SiO2
4. Ionisation and dissociation of carbonyl fluoride and trifluoromethyl hypofluorite by electron impact
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2. Mechanism and dynamics of the reaction of XeF2 with fluorinated Si(100): Possible role of gas phase dissociation of a surface reaction product in plasmaless etching;The Journal of Chemical Physics;2009-04-28
3. Investigations on the mechanism of silicon etching with chlorine-trifluoride;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
4. Silicon Dioxide Film with Low Dielectric Constants using Liquid-Phase Deposition;Japanese Journal of Applied Physics;1999-10-15
5. Spontaneous etching of Si(100) by XeF2: Test case for a new beam surface experiment;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-11
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