Etching organic low dielectric film in ultrahigh frequency plasma using N2/H2 and N2/NH3 gases
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1588351
Reference16 articles.
1. Thermal Decomposition of Low Dielectric Constant Pulsed Plasma Fluorocarbon Films: I. Effect of Precursors and Substrate Temperature
2. Fluorinated–chlorinated SiO2 films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of SiF4 and SiCl4
3. Low k, Porous Methyl Silsesquioxane and Spin-On-Glass
4. Low-kSi–O–C–H composite films prepared by plasma-enhanced chemical vapor deposition using bis-trimethylsilylmethane precursor
5. Dielectric property and microstructure of a porous polymer material with ultralow dielectric constant
Cited by 43 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Low-pressure inductively coupled plasmas in hydrogen: impact of gas heating on the spatial distribution of atomic hydrogen and vibrationally excited states;Plasma Sources Science and Technology;2024-02-01
2. Radical-controlled plasma processes;Reviews of Modern Plasma Physics;2022-11-10
3. Wide range applications of process plasma diagnostics using vacuum ultraviolet absorption spectroscopy;Reviews of Modern Plasma Physics;2022-07-01
4. Application and evaluation of nitriding treatment using active screen plasma;Surface and Coatings Technology;2019-09
5. Enhanced Corrosion Resistance of Silicone-Modified Epoxy Coatings by Surface-Wave Plasma Treatment;International Journal of Electrochemical Science;2019-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3