Properties ofp+microcrystalline films of SiC:H deposited by conventional rf glow discharge
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.100193
Reference10 articles.
1. Properties and structure ofa‐SiC:H for high‐efficiencya‐Si solar cell
2. Substrate temperature dependence of microcrystallinity in plasma‐deposited, boron‐doped hydrogenated silicon alloys
3. Properties and photovoltaic applications of microcrystalline silicon films prepared by rf reactive sputtering
4. Raman scattering in pure and hydrogenated amorphous germanium and silicon
5. The effects of microcrystal size and shape on the one phonon Raman spectra of crystalline semiconductors
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