Preparation of atomically clean silicon surfaces by pulsed laser irradiation
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.91315
Reference10 articles.
1. Generation of clean surfaces in high vacuum
2. Laser Annealing of Ion-Implanted Semiconductors
3. Redistribution of dopants in ion‐implanted silicon by pulsed‐laser annealing
4. Redistribution of dopants in ion‐implanted silicon by pulsed‐laser annealing
5. A comparative study of laser and thermal annealing of boron‐implanted silicon
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