Photoemission study of carbon depletion from ultralow-κ carbon doped oxide surfaces during the growth of Mn silicate barrier layers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3669998
Reference18 articles.
1. The evolution of diffusion barriers in copper metallization
2. Selective Chemical Vapor Deposition of Manganese Self-Aligned Capping Layer for Cu Interconnections in Microelectronics
3. Chemical and structural investigation of the role of both Mn and Mn oxide in the formation of manganese silicate barrier layers on SiO2
4. Synchrotron radiation photoemission study of in situ manganese silicate formation on SiO2 for barrier layer applications
5. Graded composition and valence states in self-forming barrier layers at Cu–Mn/SiO2 interface
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3. In-situ transmission electron microscopy study of thermal stability and carbide formation in amorphous Cu-Mn/C films for interconnect applications;Journal of Physics and Chemistry of Solids;2018-10
4. On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers;Applied Surface Science;2018-01
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