Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature-Reference-Cited by-同舟云学术

Solution Layer Deposition: A Technique for the Growth of Ultra-Pure Manganese Oxides on Silica at Room Temperature

Author:

Cure Jérémy¹²³,Piettre Kilian¹²³,Coppel Yannick¹²,Beche Eric⁴,Esvan Jérôme⁵,Collière Vincent¹²,Chaudret Bruno⁶,Fau Pierre¹²

Affiliation:

1. CNRS, LCC (Laboratoire de Chimie de Coordination); 205 Route de Narbonne BP 44099 31077 Toulouse Cedex 4 France

2. Université de Toulouse; UPS, INPT 31077 Toulouse Cedex 4 France

3. STMicroelectronics SAS; 10 impasse Thales de Millet 37070 Tours France

4. PROMES-CNRS; 7 rue du four solaire 66120 Font-Romeu-Odeillo France

5. CIRIMAT-ENSIACET; 4 allée Emile Monso BP44362 31030 Toulouse Cedex 4 France

6. LPCNO, INSA-UPS-CNRS; 135 avenue de Rangueil 31077 Toulouse Cedex 4 France

Funder

ANRT

CNRS

Publisher

Wiley

Subject

General Chemistry,Catalysis

Link

Reference20 articles.

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