Atomic layer deposition of SiO2–GeO2 multilayers
Author:
Affiliation:
1. Zernike Institute for Advanced Materials, University of Groningen, 9747AG Groningen, The Netherlands
2. MESA+ Institute for Nanotechnology, University of Twente, PO Box 217, 7522 NH Enschede, The Netherlands
Funder
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0009844
Reference43 articles.
1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
2. A brief review of atomic layer deposition: from fundamentals to applications
3. Atomic Layer Deposition of Noble Metals and Their Oxides
4. Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review
5. Atomic layer deposition of functional multicomponent oxides
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